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Various sample fabrication sysmtems (deposition, lithography, etching, etc) and measurement apparatuses are available.
Sample deposition
1. Molecular beam epitaxy and surface analysis system
2. Ultra high vacuum magnetron sputtering system with 5 sources
3. Magnetron sputtering system with 3 sources, No. 1
4. Magnetron sputtering system with 3 sources, No. 2
5. Ultra high vacuum magnetron sputtering system with 8 sources
Microfabrication and Annealing
1. Mask aligner
2. Field annealing system
Measurements
1.
Vibrating sample magnetometer (VSM)
2. Alternating gradient field magnetometer (AGFM)
3. Torque magnetometer
4. Magneto-optical spectra measurement system
5. Optical spectrometer
6. Optical Microscope with polarization analysis
7. Tabletop manual wire bonder
8. Horizontal and vertical field probe station
Other apparatuses in RFAST
1. Ultra high vacuum magnetron sputtering system with 8 sources
2. Molecular beam epitaxy with 8 sources
3. ECR plasma ething system with end point detector
4. X-ray diffractometry (18kW) (XRD)
5. Atomic force microscopy (AFM)
6. Electron beam lighography system (JEOL JBX-6300FS)
7. Scanning electron microscopy with energy dispersive spectroscopy (JOEL
JSM-6301F)
8. Time-resolved magneto-optical Kerr effect (TRMOKE)
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