Specifications
ANELVA
Base pressure: 1 x 10-8 Pa
8 pockets for deposition sources
Source shutter system for multilayer deposition
2 high voltage DC power supplies
RHEED surface analysis system
Substrate heating up to 1000 degC
Ar ion source for substrate cleaning
Sample load-lock system and sample transfer system to ECR-SIMS and a sputtering system with 8 targets without breaking vacuum
