Specifications
[Deposition chamber]
ANELVA
Base pressure: 1 x 10-8 Pa
4 pockets for deposition sources
3 high voltage DC power supplies
RHEED surface analysis system
Substrate heating up to 1000 degC
Source shutter system for multilayer deposition[Surface Kerr measurement system]
under construction[Scanning tunnel microscope]
Laboratory made
Base pressure: 1 x 10-8 Pa
