Specifications
Laboratory made
Base pressure: 1 x 10-7 Pa
4 targets (3 inch dia.), 1 target (2 inch dia.)
3 RF power supplies and 2 DC supplies
Substrate sputtering system
Substrate water cooling system
Substrate rotation and target shutter system for the multilayer deposition
Sample load-lock system and sample transfer system to FIB and a sputtering system with 8 targets without breaking vacuum
